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Nickel-silicide process for ultra-thin-body SOI-MOSFETs

Authors : Schmidt T. Mollenhauer H.D.B. Gottlobo T. Wahlbrink J.K. Efavi L. Ottaviano S. Cristoloveanu M.C. Lemme H. Kurz, M.;

Subjects: [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics; ComputingMilieux_MISCELLANEOUS; [SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics

Source: Microelectronic EngineeringMicroelectronic Engineering, Elsevier, 2005, 82, n± 3–4, pp.497-502

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